Wei-Hsiang Lin is currently an assistant professor in the Department of Physics at National Chung Hsing University (NCHU) and his research focuses on the synthesis of large-scale 2D heterostructures for the valleytronic device applications. Before becoming an assistant professor, he was a R&D module process engineer in TSMC working on the new n-type and p-type dipole materials to tune the work function in the gate stacking structure of the N2 and N1.4 nodes. He graduated from the department of Applied Physics at California Institute of Technology (Caltech), and co-advised by Prof. Nai-Chang Yeh and Prof. Harry Atwater in advanced two-dimensional (2D) materials synthesis, surface science, nanofabrication and device characterization. Up to now, he has published more than 12 journal papers on ACS Nano, Nano Letters, Nature Communications, Advanced Science,  Advanced Materials, etc. as the first and co-author.